Silicon is extensively used in the manufacture of integrated circuit devices such as transistors and

Silicon is extensively used in the manufacture of integrated circuit devices such as transistors and light-emitting diodes. It is often necessary to develop a thin oxide layer (SiO2) on silicon wafers. (a) What are the differences in properties between the silicon substrate and the oxide layer? (b) Design a process that produces the oxide layer on a silicon wafer. (c) Design a process that forms the oxide layer only in certain desired areas.